Product Introduction
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- Single Wafer Cleaning Equipment
Cleaning Equipment, Research and Development Equipment for General Industry
Single Wafer Cleaning Equipment
This machine transfers a substrate by single-wafer, cleans it with detergent, shower, ultrasonic wave and etc.
For acceptance cleaning, cleaning before PI printing and etc.
Features and Intended Use
Not only glass but also 0.1 mm film single wafer can be cleaned.
An example of specifications
| Items | Specifications |
|---|---|
| Object to be cleaned | - |
| Name | Glass substrate for LCD |
| Dimensions | 14" x 16" t 0.4, 0.55, 0.7, 1.1 |
| Basic specification | - |
| Body dimensions | Depth (length in the traveling direction) x Width x Height (with division) |
| - | Approximately 10.450 [mm] x 1,400 [mm] x FL + 1,650 [mm] (not including protrusions) |
| Body weight | Approximately 5,200 kg (dry weight) |
| Transfer method | Horizontal single wafer transfer method |
Option
* Specifications are different depend on the substrate size. Please feel free contact us for the details.