Product Introduction

Cleaning Equipment, Research and Development Equipment for General Industry

Single Wafer Cleaning Equipment

This machine transfers a substrate by single-wafer, cleans it with detergent, shower, ultrasonic wave and etc.
For acceptance cleaning, cleaning before PI printing and etc.

Features and Intended Use

Not only glass but also 0.1 mm film single wafer can be cleaned.

An example of specifications

Items Specifications
Object to be cleaned -
Name Glass substrate for LCD
Dimensions 14" x 16" t 0.4, 0.55, 0.7, 1.1
Basic specification -
Body dimensions Depth (length in the traveling direction) x Width x Height (with division)
- Approximately 10.450 [mm] x 1,400 [mm] x FL + 1,650 [mm] (not including protrusions)
Body weight Approximately 5,200 kg (dry weight)
Transfer method Horizontal single wafer transfer method


* Specifications are different depend on the substrate size. Please feel free contact us for the details.