- Product Introduction
- Cleaning Equipment, Research and Development Equipment for General Industry
- Vacuum Deposition Equipment
Cleaning Equipment, Research and Development Equipment for General Industry
Vacuum Deposition Equipment
Resistance heating type, vacuum deposition equipment
Features and Intended Use
Optimal compact size for lab use. Vapor deposition of metals and metal oxides are possible.
An example of specifications
|Inside dimension of chamber
|W300 x D300 x H400 (mm)
|From atmospheric pressure to 4Pa order, approximately 30 minutes. (criterion in case of gold vapor deposition)
|With crystal transmission type, film thickness monitor
|Equipped rotation mechanism of substrate holder with speed adjustment function.
|Installed in deposition source and substrate holder part.
|Rotary pump + Diffuser pump
|Pirani vacuum gauge + Broadband ionization vacuum gauge
|W800 x D770 x H1510 (mm) / standard
|Approximately 180 kg
|AC 200 V 3 phase 50 Hz / 60 Hz 30 A
|From 0.6 Mpa to 1 Mpa 50L/min or more
|From 0.3 MPa to 0.7 Mpa 30 L / min
|3L/MIN (20 degrees) Differencial pressure 0.2 Mpa is required.
* Specifications are different depend on the substrate size. Please feel free contact us for the details.